The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
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The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
L'augmentation du temps requis pour le traitement des données, le dessin du masque et l'inspection du photomasque a entraîné une augmentation substantielle du coût de fabrication des masques. C’est devenu l’un des défis majeurs de l’industrie des semi-conducteurs. Nous avons développé un processus de flux de données pour la fabrication de masques dans lequel nous faisons référence aux informations sur l'intention de conception afin de réduire le TAT des processus de fabrication de masques. Nous convertissons les informations au niveau de la conception « Design Intent (DI) » en informations prioritaires des données de fabrication de masques connues sous le nom de « Mask Data Rank (MDR) » afin que nous puissions identifier et trier l'importance des modèles de masques du point de vue du côté conception. . En conséquence, nous pouvons réduire le temps d’écriture des masques et le temps d’inspection des masques. Notre objectif est de construire un système efficace de conversion de flux de données de DI vers MDR. Dans cet article, nous présentons l'idée du MDR et le système logiciel que nous avons construit pour l'extraction DI. Ensuite, nous montrons les résultats expérimentaux avec les données réelles de la puce. Enfin, nous discuterons des problèmes connexes et de leurs solutions.
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Kokoro KATO, Masakazu ENDO, Tadao INOUE, Shigetoshi NAKATAKE, Masaki YAMABE, Sunao ISHIHARA, "Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing" in IEICE TRANSACTIONS on Fundamentals,
vol. E93-A, no. 12, pp. 2424-2432, December 2010, doi: 10.1587/transfun.E93.A.2424.
Abstract: The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1587/transfun.E93.A.2424/_p
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@ARTICLE{e93-a_12_2424,
author={Kokoro KATO, Masakazu ENDO, Tadao INOUE, Shigetoshi NAKATAKE, Masaki YAMABE, Sunao ISHIHARA, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing},
year={2010},
volume={E93-A},
number={12},
pages={2424-2432},
abstract={The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.},
keywords={},
doi={10.1587/transfun.E93.A.2424},
ISSN={1745-1337},
month={December},}
Copier
TY - JOUR
TI - Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 2424
EP - 2432
AU - Kokoro KATO
AU - Masakazu ENDO
AU - Tadao INOUE
AU - Shigetoshi NAKATAKE
AU - Masaki YAMABE
AU - Sunao ISHIHARA
PY - 2010
DO - 10.1587/transfun.E93.A.2424
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E93-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2010
AB - The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.
ER -