The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
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The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Cet article étudie l'impact de l'effet de proximité des bords du puits sur le retard du circuit, sur la base de paramètres de modèle extraits de structures de test dans un processus industriel de tranche de 65 nm. Les résultats expérimentaux montrent que jusqu'à 10 % de l'augmentation du délai est due à l'effet de proximité au bord du puits dans la technologie 65 nm, et cela dépend de la longueur de l'interconnexion. De plus, en raison de l'augmentation asymétrique des tensions de seuil pMOS et nMOS, le retard peut diminuer malgré l'augmentation de la tension de seuil. De ces résultats, nous concluons que la prise en compte du WPE est indispensable à la caractérisation cellulaire dans la technologie 65 nm.
Toshiki KANAMOTO
Yasuhiro OGASAHARA
Keiko NATSUME
Kenji YAMAGUCHI
Hiroyuki AMISHIRO
Tetsuya WATANABE
Masanori HASHIMOTO
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Toshiki KANAMOTO, Yasuhiro OGASAHARA, Keiko NATSUME, Kenji YAMAGUCHI, Hiroyuki AMISHIRO, Tetsuya WATANABE, Masanori HASHIMOTO, "Impact of Well Edge Proximity Effect on Timing" in IEICE TRANSACTIONS on Fundamentals,
vol. E91-A, no. 12, pp. 3461-3464, December 2008, doi: 10.1093/ietfec/e91-a.12.3461.
Abstract: This paper studies impact of well edge proximity effect on circuit delay, based on model parameters extracted from test structures in an industrial 65 nm wafer process. Experimental results show that up to 10% of delay increase arises by the well edge proximity effect in the 65 nm technology, and it depends on interconnect length. Furthermore, due to asymmetric increase in pMOS and nMOS threshold voltages, delay may decrease in spite of the threshold voltage increase. From these results, we conclude that considering WPE is indispensable to cell characterization in the 65 nm technology.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1093/ietfec/e91-a.12.3461/_p
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@ARTICLE{e91-a_12_3461,
author={Toshiki KANAMOTO, Yasuhiro OGASAHARA, Keiko NATSUME, Kenji YAMAGUCHI, Hiroyuki AMISHIRO, Tetsuya WATANABE, Masanori HASHIMOTO, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Impact of Well Edge Proximity Effect on Timing},
year={2008},
volume={E91-A},
number={12},
pages={3461-3464},
abstract={This paper studies impact of well edge proximity effect on circuit delay, based on model parameters extracted from test structures in an industrial 65 nm wafer process. Experimental results show that up to 10% of delay increase arises by the well edge proximity effect in the 65 nm technology, and it depends on interconnect length. Furthermore, due to asymmetric increase in pMOS and nMOS threshold voltages, delay may decrease in spite of the threshold voltage increase. From these results, we conclude that considering WPE is indispensable to cell characterization in the 65 nm technology.},
keywords={},
doi={10.1093/ietfec/e91-a.12.3461},
ISSN={1745-1337},
month={December},}
Copier
TY - JOUR
TI - Impact of Well Edge Proximity Effect on Timing
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 3461
EP - 3464
AU - Toshiki KANAMOTO
AU - Yasuhiro OGASAHARA
AU - Keiko NATSUME
AU - Kenji YAMAGUCHI
AU - Hiroyuki AMISHIRO
AU - Tetsuya WATANABE
AU - Masanori HASHIMOTO
PY - 2008
DO - 10.1093/ietfec/e91-a.12.3461
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E91-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2008
AB - This paper studies impact of well edge proximity effect on circuit delay, based on model parameters extracted from test structures in an industrial 65 nm wafer process. Experimental results show that up to 10% of delay increase arises by the well edge proximity effect in the 65 nm technology, and it depends on interconnect length. Furthermore, due to asymmetric increase in pMOS and nMOS threshold voltages, delay may decrease in spite of the threshold voltage increase. From these results, we conclude that considering WPE is indispensable to cell characterization in the 65 nm technology.
ER -